Kaufman & Robinson Inc. introduces the Pulsed DC Sputter Power Supply, a cutting-edge 3000 Watt single-output unit optimized for both pulsed DC and standard DC magnetron sputtering in reactive and non-reactive processes. This innovative device features adjustable duty cycles and operation up to 100 kHz, along with rapid 100 ns arc detection and 1 µs mitigation for superior stability. Key highlights include adjustable reverse voltage up to 150 V, a wide 0-1000 V range at up to 10 A, variable frequencies, and low arc energy to enhance thin-film quality and process reliability.
Core Specifications
- 3000 W power tailored for pulsed DC magnetron sputtering.
- Wide voltage (0-1000 V) and current (up to 10 A) range with adjustable reverse voltage up to 150 V.
- Frequencies up to 100 kHz and fully adjustable duty cycle for versatile operation.
Key Advantages
- Ultra-fast arc handling prevents defects and downtime in demanding applications.
- Supports both reactive and non-reactive processes for advanced coatings.
- Compact rack-mount design from Kaufman & Robinson’s proven power supply lineup.
Structural Work Completed
Structural Work Completed of the new company building in Science Park III / Ulm As planned, the shell of the new company building could be completed and winterized before Christmas. Thus dry construction work can start immediately in the new year. The move to the new...