Linear Modular End Hall Ion Source

The EHL200-X modular linear ion beam source is designed for applications utilizing moving flat substrates like for glass, web or foil coatings.

The modular linear ion source uses cylindrical end-Hall modules in a linear array. The modules are operated in parallel so that there is a single gas flow to the ion source, a single discharge power supply, and a single hollow-cathode electron source, similar to a non-modular design. The spacing between the modules can be varied to obtain a wide range of operating characteristics while keeping a high degree of ion-dose uniformity along the length.

Applications include:

  • Ion Beam Assisted Deposition (IBAD)
  • In-Situ Substrate Precleaning

EH1000 Ion Source

© KRI 2005

Comparison
Conventional linear ion beam source Modular linear ion beam source
OCnventional linear source Modular linear ion beam source

A single linear ion beam source is used to process the substrate area.
Cylindrical ion beam sources are lined up to an array
  • high gas consumption
  • inflexible arrangement
  • thermal expansion issues
  • limited operating range

  • high beam current
  • flexible module arrangment
  • large operating range
  • fully neutralized ion beam

The EHL200-X modular linear source array enables for uniformities of +/- 5% over more than 80% of the source length @ 30cm source-to-substrate distance.
For more information about modular linear ion beam sources please request a copy of "Modular Linear Ion Source" at BeamTec GmbH.

 
EHL 200-5
EHL 200-10
System set up
5 EH200 gridless ion sources with single hollow cathode
10 EH200 gridless ion sources with single hollow cathode
Anode Current
0-10 A
0-20 A
Beam Current
0-2300 mA
0-4600 mA
Anode Voltage
60 -225 Volts max
Beam Energy
35-160 eV mean
Gas Flow
5-100 sccm
Pressure
0.5 to 1 x 10-3 mbar
Length
360 mm
860 mm
Height
60 mm
60 mm
Uniformity
+/- 5% over 30cm at 30 cm distance
+/- 5% over 80cm at 30 cm distance