RF ICP Ion Sources

BeamTec presents the new RF ICP ion source by Kaufman & Robinson Inc.
With this new line KRI expands its product range for applications requiring higher ion energies. Typical applications include

  • Ion beam etching
  • Ion beam assist deposition
  • Ion beam sputter deposition
  • Plasma surface modification

RF ICP Plasma Source

© KRI 2007

RF ICP Versions

 

RF ICP 20cm gridded ion beam source Features
  • Inductively coupled
  • Optlin self aligning ion optics
  • Filamentless

 
 
RFICP140
RFICP200
RF Power
1 kW
1.5 kW
Beam Voltage
100 - 1000 V
100 - 1000 V
Gas Flow
1-50 sccm
1-100 sccm
Diameter
25 cm (9.8“)
41 mm (16.1“)
Heigth
25 cm (9.8“)
30 cm (11.8“)