Kaufman & Robinson Inc. introduces the Pulsed DC Sputter Power Supply, a cutting-edge 3000 Watt single-output unit optimized for both pulsed DC and standard DC magnetron sputtering in reactive and non-reactive processes. This innovative device features adjustable duty cycles and operation up to 100 kHz, along with rapid 100 ns arc detection and 1 µs mitigation for superior stability. Key highlights include adjustable reverse voltage up to 150 V, a wide 0-1000 V range at up to 10 A, variable frequencies, and low arc energy to enhance thin-film quality and process reliability.
Core Specifications
- 3000 W power tailored for pulsed DC magnetron sputtering.
- Wide voltage (0-1000 V) and current (up to 10 A) range with adjustable reverse voltage up to 150 V.
- Frequencies up to 100 kHz and fully adjustable duty cycle for versatile operation.
Key Advantages
- Ultra-fast arc handling prevents defects and downtime in demanding applications.
- Supports both reactive and non-reactive processes for advanced coatings.
- Compact rack-mount design from Kaufman & Robinson’s proven power supply lineup.
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