{"id":55211,"date":"2026-01-12T12:02:29","date_gmt":"2026-01-12T11:02:29","guid":{"rendered":"https:\/\/www.beamtec.de\/?p=55211"},"modified":"2026-07-01T18:26:35","modified_gmt":"2026-07-01T16:26:35","slug":"kri_pulsed_dc_sputter_power_supply","status":"publish","type":"post","link":"https:\/\/www.beamtec.de\/en\/kri_pulsed_dc_sputter_power_supply\/","title":{"rendered":"New KRI 3kW Pulsed DC supply with adjustable reverse charge"},"content":{"rendered":"

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Kaufman & Robinson Inc. introduces the Pulsed DC Sputter Power Supply, a cutting-edge 3000 Watt single-output unit optimized for both pulsed DC and standard DC magnetron sputtering in reactive and non-reactive processes. This innovative device features adjustable duty cycles and operation up to 100 kHz, along with rapid 100 ns arc detection and 1 \u00b5s mitigation for superior stability. Key highlights include adjustable reverse voltage up to 150 V<\/strong>, a wide 0-1000 V range at up to 10 A, variable frequencies, and low arc energy to enhance thin-film quality and process reliability.<\/p>\n

Core Specifications<\/h5>\n