{"id":55211,"date":"2026-01-12T12:02:29","date_gmt":"2026-01-12T11:02:29","guid":{"rendered":"https:\/\/www.beamtec.de\/?p=55211"},"modified":"2026-07-01T18:26:35","modified_gmt":"2026-07-01T16:26:35","slug":"kri_pulsed_dc_sputter_power_supply","status":"publish","type":"post","link":"https:\/\/www.beamtec.de\/en\/kri_pulsed_dc_sputter_power_supply\/","title":{"rendered":"New KRI 3kW Pulsed DC supply with adjustable reverse charge"},"content":{"rendered":"
[et_pb_section fb_built=”1″ specialty=”on” _builder_version=”4.16″ background_color=”#f7f7f7″ custom_padding=”0|0px|54px|0px|false|false” global_colors_info=”{}”][et_pb_column type=”4_4″ specialty_columns=”4″ _builder_version=”4.16″ custom_padding=”|||” global_colors_info=”{}” parallax__hover=”off” parallax_method__hover=”on” custom_padding__hover=”|||”][et_pb_row_inner _builder_version=”4.16″ global_colors_info=”{}”][et_pb_column_inner saved_specialty_column_type=”4_4″ _builder_version=”4.16″ custom_padding=”|||” global_colors_info=”{}” parallax__hover=”off” parallax_method__hover=”on” custom_padding__hover=”|||”][et_pb_text _builder_version=”4.27.4″ global_colors_info=”{}”]<\/p>\n
Kaufman & Robinson Inc. introduces the Pulsed DC Sputter Power Supply, a cutting-edge 3000 Watt single-output unit optimized for both pulsed DC and standard DC magnetron sputtering in reactive and non-reactive processes. This innovative device features adjustable duty cycles and operation up to 100 kHz, along with rapid 100 ns arc detection and 1 \u00b5s mitigation for superior stability. Key highlights include adjustable reverse voltage up to 150 V<\/strong>, a wide 0-1000 V range at up to 10 A, variable frequencies, and low arc energy to enhance thin-film quality and process reliability.<\/p>\n [\/et_pb_text][\/et_pb_column_inner][\/et_pb_row_inner][\/et_pb_column][\/et_pb_section]<\/p>\n","protected":false},"excerpt":{"rendered":" Kaufman & Robinson Inc. introduces the Pulsed DC Sputter Power Supply, a cutting-edge 3000 Watt single-output unit optimized for both pulsed DC and standard DC magnetron sputtering in reactive and non-reactive processes. This innovative device features adjustable duty cycles and operation up to 100 kHz, along with rapid 100 ns arc detection and 1 \u00b5s […]<\/p>\n","protected":false},"author":2,"featured_media":55238,"comment_status":"closed","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"_et_pb_use_builder":"on","_et_pb_old_content":"","_et_gb_content_width":"","_vp_format_video_url":"","_vp_image_focal_point":[],"footnotes":""},"categories":[19],"tags":[61,60,62],"class_list":["post-55211","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-new-products","tag-plasma-supply","tag-pulsed-dc","tag-reverse-polarity"],"yoast_head":"\nCore Specifications<\/h5>\n
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Key Advantages<\/h5>\n
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