{"id":4355,"date":"2019-01-29T14:39:00","date_gmt":"2019-01-29T13:39:00","guid":{"rendered":"https:\/\/shop.beamtec.de\/wpl\/eh2000\/"},"modified":"2019-03-05T16:30:51","modified_gmt":"2019-03-05T15:30:51","slug":"eh2000","status":"publish","type":"page","link":"https:\/\/www.beamtec.de\/en\/eh2000\/","title":{"rendered":"eH2000"},"content":{"rendered":"
[et_pb_section fb_built=”1″ _builder_version=”3.18.4″ background_color=”#f7f7f7″ max_width_phone=”100%” max_width_last_edited=”on|desktop” custom_margin=”|||0px” custom_padding=”0px||10px” saved_tabs=”all”][et_pb_row make_fullwidth=”on” custom_width_px=”2600px” use_custom_gutter=”on” gutter_width=”1″ custom_padding=”60px||60px|0px|true” custom_margin=”|||” custom_padding_last_edited=”on|desktop” padding_top_bottom_link_1=”true” padding_top_1=”0px” padding_bottom_1=”0px” padding_left_1=”0px” _builder_version=”3.19.9″ background_image=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/01\/End-hall-quelle-blur.jpg” module_alignment=”center”][et_pb_column type=”4_4″ _builder_version=”3.18.4″][et_pb_blurb title=”Ion Sources” content_max_width=”718px” _builder_version=”3.19.9″ header_level=”h1″ header_font=”||||||||” header_text_align=”center” header_text_color=”#fe871f” header_font_size=”59px” header_font_size_tablet=”37px” header_font_size_phone=”25px” header_font_size_last_edited=”on|tablet” body_font=”||||||||” body_text_align=”center” body_text_color=”#ffffff” body_font_size=”30px” body_font_size_tablet=”25px” body_font_size_phone=”20px” body_font_size_last_edited=”on|phone” custom_margin=”34px||” custom_padding=”25px||25px||true” custom_padding_tablet=”0px||0px|” custom_padding_phone=”0px||0px|” custom_padding_last_edited=”on|desktop”]<\/p>\n
eH2000<\/p>\n
[\/et_pb_blurb][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.19.12″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”0|0px|27px|0px|false|false” _builder_version=”3.19.9″][et_pb_column type=”4_4″ _builder_version=”3.19.8″][et_pb_text _builder_version=”3.19.17″]<\/p>\n
Home<\/a> \u00bb Ion Sources <\/a>\u00bb Gridless End-Hall Ion Sources<\/a> \u00bb eH2000<\/p>\n [\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.19.12″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”27px|0px|0|0px|false|false” _builder_version=”3.19.9″][et_pb_column type=”3_5″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.9″ text_font=”||||||||” text_orientation=”justified”]<\/p>\n
Discharge power<\/td>\n | 1700 W max<\/td>\n<\/tr>\n |
Anode current<\/td>\n | 10 A<\/td>\n<\/tr>\n |
Beam current<\/td>\n | 2000 mA max<\/td>\n<\/tr>\n |
Anode voltage<\/td>\n | 300 V max<\/td>\n<\/tr>\n |
Mean beam energy<\/td>\n | 35 – 210 eV<\/td>\n<\/tr>\n |
Gas flow<\/td>\n | 1 – 100 sccm<\/td>\n<\/tr>\n |
Divergence<\/td>\n | 60\u00b0<\/td>\n<\/tr>\n |
Operating pressure<\/td>\n | up to 1 x 10-3 mbar<\/td>\n<\/tr>\n |
Height<\/td>\n | 100 mm<\/td>\n<\/tr>\n |
Weight<\/td>\n | 3,6 kg<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n <\/p>\n [\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.19.12″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”27px|0px|19px|0px|false|false” _builder_version=”3.19.8″][et_pb_column type=”4_4″ _builder_version=”3.19.8″][et_pb_text _builder_version=”3.19.17″ text_font=”||||||||” text_orientation=”justified”]<\/p>\n The eH2000 product versatility can be realized through optimized configurations for specific applications. For example, the eH2000 can be easily modified to produce extra ion O2 beam current for the same input power. By a simple reconfiguration, the ion source will produce more ion beam current for a given plasma power. With little cost, this feature allows the process engineer to upgrade the same ion source for new applications which benefit from higher O2 ion currents.<\/p>\n The EH2000 product line produces a high current and low energy ion beam ideally suited for surface treatment and thin film growth applications. Amongst others:<\/p>\n
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