{"id":4353,"date":"2019-01-29T12:42:08","date_gmt":"2019-01-29T11:42:08","guid":{"rendered":"https:\/\/shop.beamtec.de\/wpl\/eh1000\/"},"modified":"2019-07-08T09:00:19","modified_gmt":"2019-07-08T07:00:19","slug":"eh1000","status":"publish","type":"page","link":"https:\/\/www.beamtec.de\/en\/eh1000\/","title":{"rendered":"eH1000"},"content":{"rendered":"
[et_pb_section fb_built=”1″ _builder_version=”3.22.3″ background_color=”#f7f7f7″ max_width_phone=”100%” max_width_last_edited=”on|desktop” custom_margin=”|||0px” custom_padding=”0px||10px” saved_tabs=”all”][et_pb_row use_custom_gutter=”on” gutter_width=”1″ custom_padding=”60px||60px|0px|true” custom_margin=”|||” custom_padding_last_edited=”on|desktop” padding_top_bottom_link_1=”true” padding_top_1=”0px” padding_bottom_1=”0px” padding_left_1=”0px” module_class=” et_pb_row_fullwidth” _builder_version=”3.22.3″ background_image=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/01\/End-hall-quelle-blur.jpg” width=”100%” width_tablet=”100%” width_last_edited=”on|desktop” max_width=”100%” max_width_tablet=”100%” max_width_last_edited=”on|desktop” module_alignment=”center” make_fullwidth=”on” custom_width_px=”2600px”][et_pb_column type=”4_4″ _builder_version=”3.18.4″][et_pb_blurb title=”Ion Sources” content_max_width=”718px” _builder_version=”3.19.9″ header_level=”h1″ header_font=”||||||||” header_text_align=”center” header_text_color=”#fe871f” header_font_size=”59px” body_font=”||||||||” body_text_align=”center” body_text_color=”#ffffff” body_font_size=”30px” custom_margin=”34px||” custom_padding=”25px||25px||true” custom_padding_tablet=”0px||0px|” custom_padding_phone=”0px||0px|” custom_padding_last_edited=”on|desktop” header_font_size_tablet=”37px” header_font_size_phone=”25px” header_font_size_last_edited=”on|tablet” body_font_size_tablet=”25px” body_font_size_phone=”20px” body_font_size_last_edited=”on|phone”]<\/p>\n
eH1000<\/p>\n
[\/et_pb_blurb][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.22.3″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”0|0px|27px|0px|false|false” _builder_version=”3.22.3″][et_pb_column type=”4_4″ _builder_version=”3.19.8″][et_pb_text _builder_version=”3.19.17″]<\/p>\n
Home<\/a> \u00bb Ion Sources <\/a>\u00bb Gridless End-Hall Ion Sources<\/a> \u00bb eH1000<\/p>\n [\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.22.3″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”27px|0px|0|0px|false|false” _builder_version=”3.22.3″][et_pb_column type=”3_5″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.17″ text_font=”||||||||” text_orientation=”justified”]<\/p>\n The eH1000 is the workhorse ion source for in-situ preclean and ion assisted deposition. Regularly installed in a wide variety of vacuum deposition systems, it is the new standard ion source in thin film fabrication. Its industrial success is founded in multiple attributes, including efficient plasma conversion and stable power control. The ability to produce critical ion beam properties results in dense and stable films. Whether installed in single rotation or planetary configurations, the eH1000 uniformly covers large substrate areas. [\/et_pb_text][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/01\/EH1000F-plasma.jpg” align=”center” align_tablet=”center” align_last_edited=”on|desktop” _builder_version=”3.23″ max_width=”40%”][\/et_pb_image][\/et_pb_column][et_pb_column type=”2_5″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.9″ text_font=”||||||||” ol_font=”||||||||” header_font=”||||||||” module_alignment=”center” animation_style=”slide” animation_delay=”200ms” animation_intensity_slide=”0%”]<\/p>\n
The eH1000 performance has led to its growth as our thin film coating and OEMs customer have benefited from its advantages.<\/p>\nSpecifications<\/h2>\n
Discharge power<\/td>\n | 850 W max<\/td>\n<\/tr>\n |
Anode current<\/td>\n | 8 A<\/td>\n<\/tr>\n |
Beam current<\/td>\n | 2000 mA max<\/td>\n<\/tr>\n |
Anode voltage<\/td>\n | 300 V max<\/td>\n<\/tr>\n |
Mean beam energy<\/td>\n | 35 – 210 eV<\/td>\n<\/tr>\n |
Gas flow<\/td>\n | 1 – 100 sccm<\/td>\n<\/tr>\n |
Divergence<\/td>\n | 60\u00b0<\/td>\n<\/tr>\n |
Operating pressure<\/td>\n | up to 1 x 10-3 mbar<\/td>\n<\/tr>\n |
Height<\/td>\n | 100 mm<\/td>\n<\/tr>\n |
Weight<\/td>\n | 3,6 kg<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n <\/p>\n [\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.22.3″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”27px|0px|19px|0px|false|false” _builder_version=”3.22.3″][et_pb_column type=”4_4″ _builder_version=”3.19.8″][et_pb_text _builder_version=”3.19.17″ text_font=”||||||||” text_orientation=”justified”]<\/p>\n The eH1000 product versatility can be realized through optimized configurations for specific applications. For example, the eH1000 can be easily modified to produce extra ion O2 beam current for the same input power. By a simple reconfiguration, the ion source will produce more ion beam current for a given plasma power. By a simple reconfiguration, the ion source will produce more ion beam current for a given plasma power. With little cost, this feature allows the process engineer to upgrade the same ion source for new applications which benefit from higher O2 ion currents.<\/p>\n The EH1000 product line produces a high current and low energy ion beam ideally suited for surface treatment and thin film growth applications. Amongst others:<\/p>\n
|