[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.19.9″ background_color=”#f7f7f7″ custom_padding=”0|0px|0|0px|false|false”][et_pb_row custom_padding=”27px|0px|0|0px|false|false” _builder_version=”3.19.9″][et_pb_column type=”2_3″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.17″ header_font=”||||||||” header_4_font=”||||||||” header_4_text_color=”#fe871f”]Linear ion sources generate wide ion beams with high uniformity along their length. These anode layer type ion beam sources are very reliable and robust devices that can be operated with a wide range of gases and mixtures. They don’t need an extra neutralizer for charge compensation and thus are able to continuously operate using chemically active gases (oxygen, air, halogens, etc.). The source electrodes have almost unlimited lifetime when working with oxygen. For many applications air can be used instead of oxygen.<\/p>\n
Mounting configurations<\/h4>\n
All linear ion sources are available for internal and external mount configurations. Internally mount sources include a single KF25 utility port. A tilting head option with variable penetration depth e.g. for ion assist in confocal sputtering applications can be ordered for the smaller L125 and L145 sources.<\/p>\n
Power supply package<\/h4>\n
Along with the inverted magnetron ion sources we provide dedicated voltage or current controlled power supplies. When utilizing its integrated gas control feature both ion beam current and anode voltage can be kept constant.<\/p>\n
Circular ion source D52<\/h4>\n
Apart from the linear sources the circular ion source D52 provides a tubular beam profile with 22 mm in diameter and small divergence. Thus it is ideal for ion beam sputtering or etching applications onto small targets or substrates while offering high ion energies with up to 150 mA ion beam current.<\/p>\n
[\/et_pb_text][\/et_pb_column][et_pb_column type=”1_3″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.10″ text_font=”||||||||” header_font=”||||||||” header_3_font=”||||||||” header_3_text_color=”#fe871f” header_4_font=”||||||||”]<\/p>\n
Features & Benefits<\/h3>\n\n- Compact linear design<\/li>\n
- Internal and flange mount versions<\/li>\n
- Long electrode lifetime<\/li>\n
- Self-neutralizing ion beam<\/li>\n
- High ion density<\/li>\n
- Compatible with a variety of gases<\/li>\n
- Wide pressure range up to 1E-1 mbar<\/li>\n<\/ul>\n
[\/et_pb_text][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/D52-plasma-2.jpg” align=”center” _builder_version=”3.19.10″ max_width_tablet=”69%” max_width_phone=”100%” max_width_last_edited=”on|phone”][\/et_pb_image][\/et_pb_column][\/et_pb_row][et_pb_row make_equal=”on” _builder_version=”3.19.10″][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/IBS-D52-2.png” align=”center” _builder_version=”3.19.10″ max_width=”56%” max_width_phone=”40%” max_width_last_edited=”on|desktop” module_alignment=”center” custom_padding=”25px||25px||true”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/L145-1.png” align=”center” _builder_version=”3.19.10″ max_width=”90%”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/L145-Flange-Mount-1.png” align=”center” _builder_version=”3.19.10″ max_width=”40%” custom_padding=”20px||20px||true”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/L800-1.png” _builder_version=”3.19.10″][\/et_pb_image][\/et_pb_column][\/et_pb_row][et_pb_row custom_padding=”27px|0px|0|0px|false|false” _builder_version=”3.19.9″][et_pb_column type=”4_4″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.10″]Typical applications of Anode Layer sources include<\/p>\n
\n- Ion cleaning, ion etching<\/li>\n
- Ion beam assisted deposition (IBAD)<\/li>\n
- Surface modification<\/li>\n
- Ion beam sputtering (IBS)<\/li>\n
- PECVD & DLC<\/li>\n<\/ul>\n
[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.19.9″ background_color=”#f7f7f7″ custom_padding=”0|0px|54px|0px|false|false”][et_pb_row _builder_version=”3.19.12″][et_pb_column type=”4_4″ _builder_version=”3.19.12″][et_pb_tabs _builder_version=”3.19.18″ tab_font=”||||||||” tab_text_color=”#fe871f” tab_font_size=”16px”][et_pb_tab title=”Models & Specifications” _builder_version=”3.19.18″ tab_font=”||||||||” tab_text_color=”#fe871f” tab_font_size=”16px”]<\/p>\n
\n\n\n\n\n\t<\/th> D52<\/th> L125<\/th> L145<\/th> L400<\/th> L600<\/th> L800<\/th>\n<\/tr>\n<\/thead>\n \n\n\tSupply Voltage<\/td> <\/td> <\/td> 500 .. 5000 V<\/td> <\/td> <\/td>\n<\/tr>\n \n\tMean ion energy<\/td> <\/td> <\/td> Ca. 1\/2 der Versorgungsspannung<\/td> <\/td> <\/td>\n<\/tr>\n \n\tMax. beam current<\/td> 150 mA<\/td> 300 mA<\/td> 350 mA<\/td> 1000 mA<\/td> 1500 mA<\/td> 2000 mA<\/td>\n<\/tr>\n \n\tGas efficiency<\/td> 8 mA\/sccm<\/td> <\/td> <\/td> 10 mA\/sccm<\/td> <\/td>\n<\/tr>\n \n\tBeam shape<\/td> R\u00f6hre<\/td> <\/td> <\/td> Hohles Rechteck<\/td> <\/td>\n<\/tr>\n \n\tBeam size<\/td> 22 mm dia<\/td> 100 x 42 mm<\/td> 120 x 42 mm<\/td> 375 x 42 mm<\/td> 575 x 42 mm<\/td> 775 x 42 mm<\/td>\n<\/tr>\n \n\tInternal source length<\/td> 52 mm dia<\/td> 126 mm<\/td> 146 mm<\/td> 396 mm<\/td> 600 mm<\/td> 800 mm<\/td>\n<\/tr>\n \n\tExternal flange<\/td> ISO63K<\/td> ISO160K<\/td> ISO160K<\/td> 480 x 186 mm<\/td> 684 x 186 mm<\/td> 884 x 186 mm<\/td>\n<\/tr>\n \n\tBeam divergence angle<\/td> <\/td> <\/td> 2\u00b0<\/td> <\/td> <\/td>\n<\/tr>\n \n\tOperating pressure<\/td> <\/td> <\/td> 1E-5 bis 1E-1<\/td> <\/td> <\/td>\n<\/tr>\n \n\tWork gas<\/td> <\/td> <\/td> Ar, H2, He, Xe, O2, N2, CxHy, CO2, CxFy<\/td> <\/td> <\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n<\/div>\n[\/et_pb_tab][et_pb_tab title=”Downloads” _builder_version=”3.19.12″]![\"adobe-pdf-icon\"](\"https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/adobe-pdf-icon.png\")
![\"Anode-Layer-Ionsources-brochure\"](\"data:image\/gif;base64,R0lGODlhAQABAAAAACH5BAEKAAEALAAAAAABAAEAAAICTAEAOw==\")
![\"Anode-Layer-Ionsources-brochure\"](\"https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/Anode-Layer-Ionsources-brochure.jpg\")
[\/et_pb_text][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/D52-plasma-2.jpg” align=”center” _builder_version=”3.19.10″ max_width_tablet=”69%” max_width_phone=”100%” max_width_last_edited=”on|phone”][\/et_pb_image][\/et_pb_column][\/et_pb_row][et_pb_row make_equal=”on” _builder_version=”3.19.10″][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/IBS-D52-2.png” align=”center” _builder_version=”3.19.10″ max_width=”56%” max_width_phone=”40%” max_width_last_edited=”on|desktop” module_alignment=”center” custom_padding=”25px||25px||true”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/L145-1.png” align=”center” _builder_version=”3.19.10″ max_width=”90%”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/L145-Flange-Mount-1.png” align=”center” _builder_version=”3.19.10″ max_width=”40%” custom_padding=”20px||20px||true”][\/et_pb_image][\/et_pb_column][et_pb_column type=”1_4″ _builder_version=”3.19.10″][et_pb_image src=”https:\/\/www.beamtec.de\/wp-content\/uploads\/2019\/02\/L800-1.png” _builder_version=”3.19.10″][\/et_pb_image][\/et_pb_column][\/et_pb_row][et_pb_row custom_padding=”27px|0px|0|0px|false|false” _builder_version=”3.19.9″][et_pb_column type=”4_4″ _builder_version=”3.19.9″][et_pb_text _builder_version=”3.19.10″]Typical applications of Anode Layer sources include<\/p>\n
- \n
- Ion cleaning, ion etching<\/li>\n
- Ion beam assisted deposition (IBAD)<\/li>\n
- Surface modification<\/li>\n
- Ion beam sputtering (IBS)<\/li>\n
- PECVD & DLC<\/li>\n<\/ul>\n
[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”3.19.9″ background_color=”#f7f7f7″ custom_padding=”0|0px|54px|0px|false|false”][et_pb_row _builder_version=”3.19.12″][et_pb_column type=”4_4″ _builder_version=”3.19.12″][et_pb_tabs _builder_version=”3.19.18″ tab_font=”||||||||” tab_text_color=”#fe871f” tab_font_size=”16px”][et_pb_tab title=”Models & Specifications” _builder_version=”3.19.18″ tab_font=”||||||||” tab_text_color=”#fe871f” tab_font_size=”16px”]<\/p>\n
\n\n\n\n
\n\t \n<\/th> D52<\/th> L125<\/th> L145<\/th> L400<\/th> L600<\/th> L800<\/th>\n<\/tr>\n<\/thead>\n \n\t Supply Voltage<\/td> <\/td> <\/td> 500 .. 5000 V<\/td> <\/td> <\/td>\n<\/tr>\n \n\t Mean ion energy<\/td> <\/td> <\/td> Ca. 1\/2 der Versorgungsspannung<\/td> <\/td> <\/td>\n<\/tr>\n \n\t Max. beam current<\/td> 150 mA<\/td> 300 mA<\/td> 350 mA<\/td> 1000 mA<\/td> 1500 mA<\/td> 2000 mA<\/td>\n<\/tr>\n \n\t Gas efficiency<\/td> 8 mA\/sccm<\/td> <\/td> <\/td> 10 mA\/sccm<\/td> <\/td>\n<\/tr>\n \n\t Beam shape<\/td> R\u00f6hre<\/td> <\/td> <\/td> Hohles Rechteck<\/td> <\/td>\n<\/tr>\n \n\t Beam size<\/td> 22 mm dia<\/td> 100 x 42 mm<\/td> 120 x 42 mm<\/td> 375 x 42 mm<\/td> 575 x 42 mm<\/td> 775 x 42 mm<\/td>\n<\/tr>\n \n\t Internal source length<\/td> 52 mm dia<\/td> 126 mm<\/td> 146 mm<\/td> 396 mm<\/td> 600 mm<\/td> 800 mm<\/td>\n<\/tr>\n \n\t External flange<\/td> ISO63K<\/td> ISO160K<\/td> ISO160K<\/td> 480 x 186 mm<\/td> 684 x 186 mm<\/td> 884 x 186 mm<\/td>\n<\/tr>\n \n\t Beam divergence angle<\/td> <\/td> <\/td> 2\u00b0<\/td> <\/td> <\/td>\n<\/tr>\n \n\t Operating pressure<\/td> <\/td> <\/td> 1E-5 bis 1E-1<\/td> <\/td> <\/td>\n<\/tr>\n \n\t Work gas<\/td> <\/td> <\/td> Ar, H2, He, Xe, O2, N2, CxHy, CO2, CxFy<\/td> <\/td> <\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n<\/div>\n [\/et_pb_tab][et_pb_tab title=”Downloads” _builder_version=”3.19.12″]