EH400 Gridless Ion Source

The EH400 is yet another successful ion source development from KRI, the originators and patentees of the Veeco-Commonwealth MKI & MKII ion sources.The original gridless ion source technology is now some 20 years old. However, development continued and in recent times has led to a radical redesign and improved ion source efficiency. A doubling of beam current and increase operational range is the result. High performance ion beams can now be simply and economically integrated into most thin film deposition systems.

© KRI 2002

EH400 Versions
The EH 400 being of physically compact design is ideally suited for smaller deposition systems or installation where system baseplate space restrictions apply. Its physical dimensions of only 9.4 cm dia. x 7.6 cm high disguise its powerful potential of producing 400mA of ion beam current over an ion energy range of 40 – 210 eV.

EH 400 Ion Source - Filament Version EH400F - Filament Version
This unit utilizes a robust tungsten cathode filament to provide both the plasma discharge and automatic beam neutralization. New design features enable the source to operate for extended periods with either inert or reactive gases.
EH 400 Ion Source -HC Version EH400HC - Hollow Cathode Version
This unit is provided with a new design hollow cathode electron source in place of the filament. Extremely long operational times are possible and the absence of a thermionic filament promotes a very high purity thin film environment.
Due to its modular built the EH400 series can accommodate different anode systems to best suit your process . Thus even with the compact size of the EH400 model high beam currents can be achieved at lower energies.
 
EH400
EH400 LEHO
Anode Current
3.5 A
7 A
Beam Current
875 mA max
1750 mA max
Beam Current
875 mA @ 3.5A
1250 mA @ 5A
Anode Voltage
40-300 Volts max
40-150 Volts max
Beam Energy
35-210 eV mean
35-105 eV mean
Gas Flow
1-50 sccm
1-100 sccm
Divergence
60°
Height
7.6 cm
Pressure
Up to 1 x 10-3 mbar
Weight
1.4 kg