Gridded DC Ion Sources - Kaufman Type

BeamTec presents the Kaufman ion source by Kaufman & Robinson Inc.
With this new line KRI expands its product range for applications requiring higher ion energies. Typical applications include

  • Ion beam etching and milling
  • Ion beam assist deposition
  • Ion beam sputter deposition
  • Plasma surface modification and texturing
  • Direct deposition of thin and hard coatings

RF ICP Plasma Source

© KRI 2007

KDC Gridded DC Series

 

RF ICP 20cm gridded ion beam source Features
  • DC Thermionic discharge
  • Optlin self aligning ion optics
  • Netralization with Filament or LFN (low frequency neutralizer)
  • Gas compatibility with Ar, Kr, Xe, O2, N2, H2, others
  • Beam Type: collimated, convergent, divergent
  • Internal mount or CF mount versions

 
 
KDC10
KDC40
KDC75
KDC100
KDC160
Ion Beam Current
> 10 mA
> 100 mA
> 250 mA
> 400 mA
> 650 mA
Beam Voltage
100 - 1200 V
100 - 1200 V
100 - 1200 V
100 - 1200 V
100 - 1200 V
Beam Size @ grid
10 mm Φ
40 mm Φ
75 mm Φ
100 mm Φ
160 mm Φ
Gas Flow
1-5 sccm
2-10 sccm
2-15 sccm
2-2 0sccm
2-30 sccm
Length
4.5” (11.5cm)
6.75” (17.1cm)
7.9” (20.1cm)
9.25” (23.5cm)
9.92” (25.2cm)
Diameter
1.52” (4cm)
9.25” (23.5cm)
5.5” (14cm)
7.6” (19.4cm)
9.1” (23.2cm)