EH200 Versions |
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| The EH 200 being of physically compact design is ideally suited for smaller deposition systems or installation where system baseplate space restrictions apply. Its physical dimensions of only 6.4 cm dia. x 5.1 cm height disguise its powerful potential of producing up to 500mA of ion beam current.. |
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EH200F - Filament Version This unit utilizes a robust tungsten cathode filament to provide both the plasma discharge and automatic beam neutralization. New design features enable the source to operate for extended periods with either inert or reactive gases. | |
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EH200HC - Hollow Cathode Version This unit is provided with a new design hollow cathode electron source in place of the filament. Extremely long operational times are possible and the absence of a thermionic filament promotes a very high purity thin film environment. | |



