BeamTec GmbH is a company specialized in electron and ion beam products and related components. BeamTec represents various manufacturers with high innovation potential and reliable products. Our customers can profit from extensive market knowledge and competence in supplying leading edge products.

ion beam source, end hall, electron beam, evaporator, high voltage, e-gun, guns, thin-film, hochspannung, elektronenstrahl, verdampfung, elektronenstrahlverdampfer, liner, filamente, crucibles, power supply, Sales and service company for vacuum and thin-film industry.Provides electron beam evaporators, quartz, quartz, quarze, QCM, crystal microbalance, high-voltage power supplies and related products, primary switched, fast arc management, alimentations haute tension, Évaporateur à faisceau d'électrons, KRI, Kaufman & Robinson, Ferrotec, Maxtek, Telemark, PST, MDC, Temescal, Tiegel, Heizwendel, Graphite, Grafit, controller, primär getaktete Hochspannungsversorgung, Schnittstellen, interface, Vertrieb, Filderstadt Germany Deutschland, Ferrofluidics, Magnetflüssigkeit, ferrofluid, Dichtung, Rotary Drive Feedthrough, magnetically sealed feedthrough, hermetic seal, liquid
   
 

Ion Beam Sources by Kaufman & Robinson Inc.

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BeamTec GmbH - Ion Beam Sources

EH1000 Gridless Ion Source

The EH 1000 represents the latest development in gridless ion source technology.

With over 1500 earlier generation products in the field, all carrying the Kaufman pedigree, this next generation end-hall gridless ion source delivers superior performance at lower cost, coupled with simpler maintenance and optimum reliability.

EH1000 Ion Source

© KRI 2002

EH1000 Versions

 

EH 400 Ion Source - Filament Version EH1000F - Filament Version
This unit utilizes a robust tungsten cathode filament to provide both the plasma discharge and automatic beam neutralization. New design features enable the source to operate for extended periods with either inert or reactive gases.

EH 400 Ion Source -HC Version EH1000HC - Hollow Cathode Version
This unit is provided with a new design hollow cathode electron source in place of the filament. Extremely long operational times are possible and the absence of a thermionic filament promotes a very high purity thin film environment.
The EH 1000 product line produces a high current and low energy ion beam ideally suited for surface treatment and thin film growth applications which include:
  • Ion Beam Assisted Deposition (IBAD)
  • In-Situ Substrate Precleaning
  • Diamond Like Carbon (DLC)

 
EH1000 - Next Generation
First Generation
Anode Current
8 A
5 A
Beam Current
2000 mA max
1000 mA max
Beam Current
1200 mA @ 5A
1000 mA @ 5A
Anode Voltage
300 Volts max
170 Volts max
Beam Energy
35-210 eV mean
40-120 eV mean
Gas Flow
1-100 sccm
1-100 sccm
Pressure
0.5 to 1 x 10-4 mbar
1 to 4 x 10-4 mbar
Height
100 mm
190mm
Weight
3.6 kg
6.4 kg
Divergence
60°

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